Modern Magnetic Systems
Article
2016
Comparative study of ALD SiO2 thin films for optical applications
| Author(s): | Pfeiffer, K. and Shestaeva, S. and Bingel, A. and Munzert, P. and Ghazaryan, L. and van Helvoirt, C. and Kessels, W. M. M. and Sanli, U. T. and Grévent, C. and Schütz, G. and Putkonen, M. and Buchanan, I. and Jensen, L. and Ristau, D. and Tünnermann, A. and Szeghalmi, A. |
| Journal: | {Optical materials express} |
| Volume: | 6 |
| Number (issue): | 2 |
| Pages: | 660--670 |
| Year: | 2016 |
| Publisher: | OSA |
| Bibtex Type: | Article (article) |
| DOI: | 10.1364/OME.6.000660 |
| Address: | Washington, DC |
| Electronic Archiving: | grant_archive |
| Language: | eng |
BibTex
@article{escidoc:0071,
title = {{Comparative study of ALD SiO2 thin films for optical applications}},
journal = {{Optical materials express}},
volume = {6},
number = {2},
pages = {660--670},
publisher = {OSA},
address = {Washington, DC},
year = {2016},
slug = {escidoc-0071},
author = {Pfeiffer, K. and Shestaeva, S. and Bingel, A. and Munzert, P. and Ghazaryan, L. and van Helvoirt, C. and Kessels, W. M. M. and Sanli, U. T. and Gr\'event, C. and Sch\"utz, G. and Putkonen, M. and Buchanan, I. and Jensen, L. and Ristau, D. and T\"unnermann, A. and Szeghalmi, A.}
}