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Selectable Nanopattern Arrays for Nanolithographic Imprint and Etch-Mask Applications
A parallel nanolithographic patterning method is presented that can be used to obtain arrays of multifunctional nanoparticles. These patterns can simply be converted into a variety of secondary nanopatterns that are useful for nanolithographic imprint, plasmonic, and etch-mask applications.
@article{2015jeong, title = {Selectable Nanopattern Arrays for Nanolithographic Imprint and Etch-Mask Applications}, journal = {Adv. Science}, abstract = {A parallel nanolithographic patterning method is presented that can be used to obtain arrays of multifunctional nanoparticles. These patterns can simply be converted into a variety of secondary nanopatterns that are useful for nanolithographic imprint, plasmonic, and etch-mask applications. }, volume = {2}, number = {7}, pages = {1500016}, year = {2015}, note = {Featured cover article.}, slug = {advs-advs201500016}, author = {Jeong, H. H. and Mark, Andrew G. and Lee, Tung-Chun and Son, Kwanghyo and Chen, Wenwen and Alarcon-Correa, Mariana and Kim, Insook and Sch{\"u}tz, Gisela and Fischer, Peer}, url = {http://dx.doi.org/10.1002/advs.201500016} }