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Micro, Nano, and Molecular Systems Article 2015

Selectable Nanopattern Arrays for Nanolithographic Imprint and Etch-Mask Applications

Thumb ticker sm jeong hyeon ho2
Micro, Nano, and Molecular Systems
Jeong Hyeon-Ho
  • Postdoctoral Researcher
Thumb ticker sm mark andrew
Micro, Nano, and Molecular Systems
Andrew Mark
PostDoc, Petzow Prize winner (2015), now Manager of Optical Engineering at Metamaterial Technologies Inc. (MTI), Nova Scotia, Canada.
Thumb ticker sm lee tung chun john
Micro, Nano, and Molecular Systems
Tung Chun Lee
PostDoc, now Lecturer, Institute for Materials Discovery, University College London
Thumb ticker sm alarcon correa mariana
Micro, Nano, and Molecular Systems
Mariana Alarcon-Correa
  • Postdoctoral Researcher
Thumb ticker sm insook kim
Micro, Nano, and Molecular Systems
Insook Kim
Thumb ticker sm peer fischer portrait
Micro, Nano, and Molecular Systems
Peer Fischer
Professor
Advs201570022 gra 0001 m

A parallel nanolithographic patterning method is presented that can be used to obtain arrays of multifunctional nanoparticles. These patterns can simply be converted into a variety of secondary nanopatterns that are useful for nanolithographic imprint, plasmonic, and etch-mask applications.

Author(s): Jeong, H. H. and Mark, Andrew G. and Lee, Tung-Chun and Son, Kwanghyo and Chen, Wenwen and Alarcon-Correa, Mariana and Kim, Insook and Schütz, Gisela and Fischer, Peer
Journal: Adv. Science
Volume: 2
Number (issue): 7
Pages: 1500016
Year: 2015
Bibtex Type: Article (article)
DOI: 10.1002/advs.201500016
State: Published
URL: http://dx.doi.org/10.1002/advs.201500016
Electronic Archiving: grant_archive
Note: Featured cover article.

BibTex 

@article{2015jeong,
  title = {Selectable Nanopattern Arrays for Nanolithographic Imprint and Etch-Mask Applications},
  journal = {Adv. Science},
  abstract = {A parallel nanolithographic patterning method is presented that can be used to obtain arrays of multifunctional nanoparticles. These patterns can simply be converted into a variety of secondary nanopatterns that are useful for nanolithographic imprint, plasmonic, and etch-mask applications. },
  volume = {2},
  number = {7},
  pages = {1500016},
  year = {2015},
  note = {Featured cover article.},
  slug = {advs-advs201500016},
  author = {Jeong, H. H. and Mark, Andrew G. and Lee, Tung-Chun and Son, Kwanghyo and Chen, Wenwen and Alarcon-Correa, Mariana and Kim, Insook and Sch{\"u}tz, Gisela and Fischer, Peer},
  url = {http://dx.doi.org/10.1002/advs.201500016}
}