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Comparative study of ALD SiO2 thin films for optical applications
@article{escidoc:0071, title = {{Comparative study of ALD SiO2 thin films for optical applications}}, journal = {{Optical materials express}}, volume = {6}, number = {2}, pages = {660--670}, publisher = {OSA}, address = {Washington, DC}, year = {2016}, slug = {escidoc-0071}, author = {Pfeiffer, K. and Shestaeva, S. and Bingel, A. and Munzert, P. and Ghazaryan, L. and van Helvoirt, C. and Kessels, W. M. M. and Sanli, U. T. and Gr\'event, C. and Sch\"utz, G. and Putkonen, M. and Buchanan, I. and Jensen, L. and Ristau, D. and T\"unnermann, A. and Szeghalmi, A.} }