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Ion beam lithography for direct patterning of high accuracy large area X-ray elements in gold on membranes
@article{escidoc:0276, title = {{Ion beam lithography for direct patterning of high accuracy large area X-ray elements in gold on membranes}}, journal = {{Microelectronic Engineering}}, volume = {98}, pages = {198--201}, year = {2012}, slug = {escidoc-0276}, author = {Nadzeyka, A. and Peto, L. and Bauerdick, S. and Mayer, M. and Keskinbora, K. and Gr\'event, C. and Weigand, M. and Hirscher, M. and Sch\"utz, G.} }