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Our paper "Selectable nanopattern arrays for nanolithographic imprint and etch-mask applications" is the cover article for Advanced Science, May 6, 2015, DOI: 10.1002/advs.201500016
A parallel nanolithographic patterning method is presented by P. Fischer and co-workers in article number 1500016 that can be used to obtain arrays of multifunctional nanoparticles. These patterns can simply be converted into a variety of secondary nanopatterns that are useful for nanolithographic imprint, plasmonic, and etch-mask applications. Image by Alejandro Posada Boada.
Selectable Nanopattern Arrays for Nanolithographic Imprint and Etch-Mask Applications→