Article 2019

Prediction and experimental determination of the layer thickness in SIMS depth profiling of Ge/Si multilayers: Effect of preferential sputtering and atomic mixing

Author(s): Lian, S. Y. and Kim, K. J. and Kim, T. G. and Hofmann, S. and Wang, J. Y.
Journal: Applied Surface Science
Volume: 481
Pages: 1103--1108
Year: 2019
Publisher: Elsevier B.V.
Bibtex Type: Article (article)
DOI: 10.1016/j.apsusc.2019.03.223
Address: Amsterdam
Electronic Archiving: grant_archive
Language: eng

BibTex

@article{escidoc:3149042,
  title = {Prediction and experimental determination of the layer thickness in SIMS depth profiling of Ge/Si multilayers: Effect of preferential sputtering and atomic mixing},
  journal = {Applied Surface Science},
  volume = {481},
  pages = {1103--1108},
  publisher = {Elsevier B.V.},
  address = {Amsterdam},
  year = {2019},
  slug = {escidoc-3149042},
  author = {Lian, S. Y. and Kim, K. J. and Kim, T. G. and Hofmann, S. and Wang, J. Y.}
}