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Prediction and experimental determination of the layer thickness in SIMS depth profiling of Ge/Si multilayers: Effect of preferential sputtering and atomic mixing
@article{escidoc:3149042, title = {Prediction and experimental determination of the layer thickness in SIMS depth profiling of Ge/Si multilayers: Effect of preferential sputtering and atomic mixing}, journal = {Applied Surface Science}, volume = {481}, pages = {1103--1108}, publisher = {Elsevier B.V.}, address = {Amsterdam}, year = {2019}, slug = {escidoc-3149042}, author = {Lian, S. Y. and Kim, K. J. and Kim, T. G. and Hofmann, S. and Wang, J. Y.} }